New report published by Global Info Research which offers insights on the global Plasma Etch System market.
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.
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Global Plasma Etch System Market: Forecast by Type / Application / Region
The major players in global Plasma Etch System market include: Oxford Instruments, ULVAC, Lam Research, AMEC, PlasmaTherm, SAMCO Inc., Applied Materials, Sentech, SPTS Technologies (an Orbotech Company), GigaLane, CORIAL, Trion Technology, NAURA, Plasma Etch Inc., Tokyo Electron Limited.
On the basis of product, the Plasma Etch System market is primarily split into: Inductively Coupled Plasma (ICP), Reactive Ion Etching (RIE) , Deep Reactive Ion Etching (DRIE) and Others.
On the basis on the end users/applications covers: Semiconductor Industry, Medical Industry, Electronics & Microelectronics and Others.
North America ranks the top in terms of global market size of Plasma Etch System, it consists of 48.57% of the international market in 2016. Japan comes the second, with 20.03% of the global market. Europe consists of 12.51% of the Plasma Etch System market in the same year, the other regions all together consist of 8.81%.
Applied Materials, Inc. ranks the first in terms of revenue share in Global market of Plasma Etch System, occupies 24.12% of market share in 2016; While, Lam Research, with a market share of 22.89%, comes the second; Tokyo Electron Limited, with a market share of 17.36% in 2016, comes the third. All the other manufacturers which are not included in the report together consist of approximately 27.02% of the global market in 2016.
In the next five years, the global consumption of Plasma Etch System will show upward tendency further, market size is expected to be about 7.20 B USD by 2022, CAGR will be 12.52% from 2016 to 2022. Despite the presence of fierce competition and the trend of price decrease, due to the stable demand, together with the development of the related industries. Investors are quite optimistic about this industry. There will be more new investors entering this field in the near future.
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Related Information:
United States Plasma Etch System Market 2018 Forecast to 2023
Europe Plasma Etch System Market 2018 Forecast to 2023
North America Plasma Etch System Market 2018 Forecast to 2023
Asia-Pacific Plasma Etch System Market 2018 Forecast to 2023
China Plasma Etch System Market 2018 Forecast to 2023
EMEA Plasma Etch System Market 2018 Forecast to 2023
Global Plasma Etch System Market 2018 Forecast to 2023
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